J. Petruzzello et al., STRUCTURAL-PROPERTIES OF NITROGEN-DOPED ZNSE EPITAXIAL LAYERS GROWN BY MBE, Journal of electronic materials, 22(5), 1993, pp. 453-456
We have used transmission electron microscopy (TEM) and high-resolutio
n x-ray diffraction (HRXRD) techniques to investigate the structural p
roperties of ZnSe doped with nitrogen, in the concentration range of 1
x 10(18) to 2 x 10(19)cm-3. The nitrogen-doped layers contain substan
tial residual compressive strain at layer thicknesses where undoped Zn
Se would be completely relaxed. The residual strain is clearly observe
d both in the inequality of the lattice constants (measured by HRXRD)
parallel and perpendicular to the growth direction, and in the reducti
on of the misfit dislocation density (measured by TEM) relative to und
oped ZnSe. In addition to the reduction in dislocation density, the mi
sfit dislocations form a regular rectangular grid, rather than the irr
egular array seen in undoped ZnSe. The effective relaxed ZnSe lattice
constant, as measured by x-ray diffraction, decreases as the nitrogen
concentration increases. For the highest nitrogen concentration, this
reduction in lattice constant, however, is greater than can be explain
ed by the shorter Zn-N bond distance of theoretical predictions.