SHORT-CHANNEL EFFECTS AND DRAIN-INDUCED BARRIER LOWERING IN NANOMETER-SCALE GAAS-MESFETS

Citation
Ja. Adams et al., SHORT-CHANNEL EFFECTS AND DRAIN-INDUCED BARRIER LOWERING IN NANOMETER-SCALE GAAS-MESFETS, I.E.E.E. transactions on electron devices, 40(6), 1993, pp. 1047-1052
Citations number
35
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
40
Issue
6
Year of publication
1993
Pages
1047 - 1052
Database
ISI
SICI code
0018-9383(1993)40:6<1047:SEADBL>2.0.ZU;2-Y
Abstract
Short-channel effects in GaAs MESFET's are investigated. MESFET's were fabricated with gate lengths in the range of 40 to 300 nm with GaAs a nd AlGaAs buffer layers. The MESFET's were characterized by dc transco nductance, output conductance, and subthreshold measurements. This wor k focuses on overcoming the short-channel effect of large output condu ctance by the inclusion of an AlGaAs buffer layer, and identifying the benefit the AlGaAs buffer affords for reducing subthreshold current, including the effect of drain-induced barrier lowering. The design yie lded 300-nm gate-length MESFET's with excellent suppression of the maj or short-channel effects.