A NEW TECHNIQUE FOR MEASURING MOSFET INVERSION LAYER MOBILITY

Citation
Cl. Huang et al., A NEW TECHNIQUE FOR MEASURING MOSFET INVERSION LAYER MOBILITY, I.E.E.E. transactions on electron devices, 40(6), 1993, pp. 1134-1139
Citations number
15
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
40
Issue
6
Year of publication
1993
Pages
1134 - 1139
Database
ISI
SICI code
0018-9383(1993)40:6<1134:ANTFMM>2.0.ZU;2-S
Abstract
We present a new experimental technique to accurately determine both t he inversion charge Q(i) and the channel mobility mu of a MOSFET. With this new technique, the inversion charge is measured as a function of the gate and drain voltages. This improvement allows the channel mobi lity to be extracted independent of drain voltage V(DS) over a wide ra nge of voltages (V(DS) = 20-100 mV). The resulting mu (V(GS)) curves f or different V(DS) show no drastic mobility roll-off at V(GS) near V(T H). This suggests that the roll-off seen in the mobility data extracte d using the split C-V method is probably due to inaccurate inversion c harge measurements instead of Coulombic scattering.