INFLUENCE OF AIR-FLOW RATE ON STRUCTURAL AND ELECTRICAL-PROPERTIES OFUNDOPED INDIUM OXIDE THIN-FILMS

Authors
MIRZAPOUR S ROZATI SM TAKWALE MG MARATHE BR BHIDE VG
Citation
S. Mirzapour et al., INFLUENCE OF AIR-FLOW RATE ON STRUCTURAL AND ELECTRICAL-PROPERTIES OFUNDOPED INDIUM OXIDE THIN-FILMS, Materials chemistry and physics, 33(3-4), 1993, pp. 204-207
Citations number
15
Categorie Soggetti
Material Science
Journal title
Materials chemistry and physics → ACNP
ISSN journal
02540584
Volume
33
Issue
3-4
Year of publication
1993
Pages
204 - 207
Database
ISI
SICI code
0254-0584(1993)33:3-4<204:IOAROS>2.0.ZU;2-M
Abstract
Using the spray pyrolysis technique thin films of indium oxide were pr epared on Corning glass (7059) at a substrate temperature of 425-degre es-C at different flow rates. The electrical and structural properties of these films were studied. The Hall measurements at room temperatur e showed that the films prepared in an air flow rate of 7 litre min-1 have the highest mobility of 47 cm2 V-1 s-1 and a minimum resistivity of 1.125x10(-3) OMEGA cm. The X-ray diffraction patterns showed that t he films have a preferred orientation of [400] which peaks at the air flow rate of 7 litre min-1.