213NM LITHOGRAPHY

Authors
HUTCHINSON JM PARTLO WN HSU R OLDHAM WG
Citation
Jm. Hutchinson et al., 213NM LITHOGRAPHY, Microelectronic engineering, 21(1-4), 1993, pp. 15-18
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
21
Issue
1-4
Year of publication
1993
Pages
15 - 18
Database
ISI
SICI code
0167-9317(1993)21:1-4<15:2L>2.0.ZU;2-B
Abstract
Optical lithography at 213 nm has been explored using a small-field hi gh-NA optic. Initial results show resolution of 0.2 mum over the full field.