X-RAY-LITHOGRAPHY WITH EFFICIENT PICOSECOND KRF LASER-PLASMA SOURCE AT 1NM WAVELENGTH

Authors
TURCU ICE ROSS IN HENING A STEYER M SOOM B WATSON JG HERMAN P
Citation
Ice. Turcu et al., X-RAY-LITHOGRAPHY WITH EFFICIENT PICOSECOND KRF LASER-PLASMA SOURCE AT 1NM WAVELENGTH, Microelectronic engineering, 21(1-4), 1993, pp. 95-98
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
21
Issue
1-4
Year of publication
1993
Pages
95 - 98
Database
ISI
SICI code
0167-9317(1993)21:1-4<95:XWEPKL>2.0.ZU;2-A
Abstract
Exposure times for X-ray lithography using excimer laser-plasma source s, are reduced by an order of magnitude when the 20 ns KrF laser pulse s are modulated with trains of 150 ps pulses using a novel excimer-dye laser system.