PROCESS ENHANCEMENTS FOR POSITIVE TONE SILYLATION

Authors
CALABRESE GS BOHLAND JF PAVELCHEK EK SINTA R DUDLEY BW JONES SK FREEMAN PW
Citation
Gs. Calabrese et al., PROCESS ENHANCEMENTS FOR POSITIVE TONE SILYLATION, Microelectronic engineering, 21(1-4), 1993, pp. 231-234
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
21
Issue
1-4
Year of publication
1993
Pages
231 - 234
Database
ISI
SICI code
0167-9317(1993)21:1-4<231:PEFPTS>2.0.ZU;2-S
Abstract
SAHR(TM) [1-3] (Silylated Acid Hardened Resist) employs chemically amp lified crosslinking of exposed areas and results in positive-toned fea tures following dry development. Two undesirable characteristics of th is process have been identified and explained in terms of physical che mical properties of the materials used. Two very simple process modifi cations are presented as solutions to these problems. Data is presente d which shows how these modifications work to improve lithographic per formance.