PATTERNING OF ORGANIC LAYERS USING NEGATIVE AND POSITIVE WORKING TOP-CARL PROCESS

Authors
LEUSCHNER R AHNE H MARQUARDT U NICKEL U SCHMIDT E SEBALD M SEZI R
Citation
R. Leuschner et al., PATTERNING OF ORGANIC LAYERS USING NEGATIVE AND POSITIVE WORKING TOP-CARL PROCESS, Microelectronic engineering, 21(1-4), 1993, pp. 255-258
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
21
Issue
1-4
Year of publication
1993
Pages
255 - 258
Database
ISI
SICI code
0167-9317(1993)21:1-4<255:POOLUN>2.0.ZU;2-5
Abstract
The Top-CARL process is a technique for patterning of some ten microns thick organic materials by top resist silylation and pattern transfer via oxygen reactive ion etching. The influence of exposure dose, temp erature and the top resist layer thickness on the silylation process i s studied. A dyed version of the resist is examined. Its polarity can be changed from negative to positive working by addition of a small am ount of a photobase.