Sl. Wang et al., SUBMICRON GAPS ON HIGH-MOBILITY SI-MOSFETS - A FLEXIBLE TOOL FOR ELECTRON-TRANSPORT STUDIES, Microelectronic engineering, 21(1-4), 1993, pp. 439-442
We have fabricated high-mobility silicon metal-oxide-semiconductor fie
ld-effect transistors containing gaps as narrow as 100 nm in the gate
electrode. The submicron gaps are defined by electron beam lithography
and by reactive ion etching. These devices can be used for a variety
of fundamental studies of quantum transport. In particular, we show th
at ballistic point contacts can be made in a Si-inversion layer.