CdTe/GaAs(001) heterostructures were fabricated by molecular beam epit
axy on chemically etched and thermally deoxidized GaAs(001) substrates
, as well as GaAs(001) (3 x 1) buffer layers grown in situ by molecula
r beam epitaxy. Different growth protocols were also explored, leading
to Te-induced (6 x 1) or (2 x 1) surface reconstructions during the e
arly growth stage. High-resolution cross-sectional transmission electr
on microscopy was used to examine the final interface structure result
ing from the different substrate preparations, and surface reconstruct
ions. The (2 x 1) surface reconstruction led to pure (001) growth, whi
le the (6 x 1) reconstruction led to an interface which included small
(111)-oriented inclusions. In addition, deposition on etched and deox
idized GaAs(001) wafers led to preferential CdTe growth within etch pi
ts and resulted in a macroscopically rough interface region.