DOPANT CONCENTRATION PROFILE IN A CZOCHRALSKI FLOW OF LIQUID-METAL INA VERTICAL OR A HORIZONTAL MAGNETIC-FIELD

Authors
Citation
K. Toh et H. Ozoe, DOPANT CONCENTRATION PROFILE IN A CZOCHRALSKI FLOW OF LIQUID-METAL INA VERTICAL OR A HORIZONTAL MAGNETIC-FIELD, Journal of crystal growth, 130(3-4), 1993, pp. 645-656
Citations number
21
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
130
Issue
3-4
Year of publication
1993
Pages
645 - 656
Database
ISI
SICI code
0022-0248(1993)130:3-4<645:DCPIAC>2.0.ZU;2-V
Abstract
Dopant concentration profiles are obtained for a Czochralski flow of l iquid metal in a static crucible under either an axisymmetric vertical magnetic field or a horizontal uniform magnetic field. The latter mag netic field inevitably requires fully three-dimensional cylindrical co ordinate model equations, which are successfully solved for the repres entative parameters Gr = 10(7), Pr = 0.01, Re = 1620 and Ha less-than- or-equal-to 1000. Asymmetric concentration profiles are obtained. The average heat flux decreased with the Hartmann number. The circumferent ial rotational direction was found to be reversed in a lower regime ag ainst that of a top rotating crystal rod in a strong lateral magnetic field. In a vertical magnetic field, the concentration profile approac hed the pure diffusion state.