The contribution of transmission electron microscopy, both conventiona
l and high resolution, to the study of compositionally modulated metal
lic multilayers (Fe/V and Co/Me with Me = Au, Cu or Pd) is illustrated
. Different growth aspects are discussed with special emphasis on the
interference of the microstructure, which usually is columnar, with th
e artificial composition modulation. The occurrence of layer curvature
and interface roughness and the degree of coherence is addressed as w
ell. Where possible, the effect of the multilayer microstructure on th
e film properties is discussed.