MOLECULAR-BEAM EPITAXIAL-GROWTH AND CHARACTERIZATION OF ZNSE ON GAAS

Citation
J. Reichow et al., MOLECULAR-BEAM EPITAXIAL-GROWTH AND CHARACTERIZATION OF ZNSE ON GAAS, Journal of crystal growth, 131(3-4), 1993, pp. 277-282
Citations number
10
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
131
Issue
3-4
Year of publication
1993
Pages
277 - 282
Database
ISI
SICI code
0022-0248(1993)131:3-4<277:MEACOZ>2.0.ZU;2-W
Abstract
Systematic investigations have been performed concerning the effect of growth temperature and beam pressure ratio on the structural perfecti on and optical properties of molecular beam epitaxy (MBE) grown ZnSe o n GaAs substrates. A surface phase diagram of ZnSe has been derived sh owing the different surface reconstructions as a function of these gro wth conditions. RHEED reflex profiling reveals more details about the surface morphology occurring in different stages of the growth process . The epitaxial layers are further characterized by means of X-ray dif fraction and various optical techniques.