Da. Neumayer et al., PREPARATION OF (PB,LA)TIO3 FILMS BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION WITH NEW LANTHANUM PRECURSORS, Integrated ferroelectrics, 14(1-4), 1997, pp. 85-93
Thin films of (Pb, La)TiO3 were grown with three new trialkylphosphine
oxide adducts of lanthanum tris-tetramethylheptanedione with the gene
ral formula La(thd)(3)(RR'R(3) '' PO)(n) where thd = tetramethylheptan
edione, (CH3)(3)CCOCHCOC(CH3)(3); R = R' = R '' = CH3; R = R' = CH3, R
'' = C4H9; R = R' = R '' = C4H9. The new precursors were compared wit
h La(thd), and were evaluated for volatility, thermal stability, ease
of transport and La incorporation into a (Pb, La)TiO3 film.