PREPARATION OF (PB,LA)TIO3 FILMS BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION WITH NEW LANTHANUM PRECURSORS

Citation
Da. Neumayer et al., PREPARATION OF (PB,LA)TIO3 FILMS BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION WITH NEW LANTHANUM PRECURSORS, Integrated ferroelectrics, 14(1-4), 1997, pp. 85-93
Citations number
10
Categorie Soggetti
Physics, Condensed Matter","Engineering, Eletrical & Electronic","Physics, Applied
Journal title
ISSN journal
10584587
Volume
14
Issue
1-4
Year of publication
1997
Pages
85 - 93
Database
ISI
SICI code
1058-4587(1997)14:1-4<85:PO(FBM>2.0.ZU;2-2
Abstract
Thin films of (Pb, La)TiO3 were grown with three new trialkylphosphine oxide adducts of lanthanum tris-tetramethylheptanedione with the gene ral formula La(thd)(3)(RR'R(3) '' PO)(n) where thd = tetramethylheptan edione, (CH3)(3)CCOCHCOC(CH3)(3); R = R' = R '' = CH3; R = R' = CH3, R '' = C4H9; R = R' = R '' = C4H9. The new precursors were compared wit h La(thd), and were evaluated for volatility, thermal stability, ease of transport and La incorporation into a (Pb, La)TiO3 film.