Qx. Jia et al., STRUCTURAL CHARACTERIZATION OF BA0.5SR0.5TIO3 ON RUO2 PREPARED BY PULSED-LASER DEPOSITION, Integrated ferroelectrics, 14(1-4), 1997, pp. 167-172
Highly conductive RuO2 thin films were epitaxially grown on (100) LaAl
O3 substrates by pulsed laser deposition. The RuO2 film deposited with
optimized conditions was (h00) oriented normal to the substrate surfa
ce with strong in-plane orientation. The RuO2 thin films deposited at
temperatures of above 500 degrees C demonstrated a room-temperature re
sistivity of 35 +/- 2 mu Omega-cm. The Ba0.5Sr0.5TiO3 thin films depos
ited on epi-RuO2 showed pure (111) orientation normal to the substrate
surface, and exhibited dielectric constant above 600 and dielectric l
oss of 0.03-0.05 at 100 kHz under zero dc bias.