The absolute efficiency curve for an ultra-thin window (UTW) high-puri
ty (intrinsic) germanium (HPGe) EDS detector was determined by compari
ng EDS spectra from a set of standard specimens with spectra from the
same compounds taken with a UTW Si(Li) detector, and with systematic c
omputer simulations. The efficiencies of the two detectors are compara
ble, except at energies between the Ge-L3 and Si-K absorption edges, w
here the efficiency of the HPGe detector is approximately 20% lower. T
he methodology employed allows important features of both detectors, p
articularly their dead layer thicknesses, to be determined.