MULTIATOMIC STEP FORMATION WITH EXCELLENT UNIFORMITY ON VICINAL (111)A GAAS-SURFACES BY METALORGANIC VAPOR-PHASE EPITAXY

Citation
Js. Lee et al., MULTIATOMIC STEP FORMATION WITH EXCELLENT UNIFORMITY ON VICINAL (111)A GAAS-SURFACES BY METALORGANIC VAPOR-PHASE EPITAXY, Journal of crystal growth, 173(1-2), 1997, pp. 27-32
Citations number
7
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
173
Issue
1-2
Year of publication
1997
Pages
27 - 32
Database
ISI
SICI code
0022-0248(1997)173:1-2<27:MSFWEU>2.0.ZU;2-J
Abstract
Giant steps with high uniformity and continuity have been successfully formed by metalorganic vapor-phase epitaxy on GaAs(111)A vicinal surf aces for the application of quantum wire fabrication. The step height is more than 30 monoatomic layer at a growth temperature of 660 degree s C. The surface morphologies obtained from scanning electron microsco py and atomic force microscopy measurements show the straight steps on (111)A substrates misoriented toward <[(2)over bar 11]> direction wit h high uniformity. Terrace uniformity and step continuity are improved as the off-angle increases. A straight section of a step exceeding 10 mu m was obtained on 4 degrees off-substrate. Fluctuation has also be en suppressed within 1 monoatomic layer height on this vicinal substra te.