DIFFRACTION BY CROSSED GRATING IN PREEXPOSED PHOTORESIST

The examination of 2-D gratings has a long history and they have been used in many diverse applications. In a previous paper the manufacture of crossed grating in pre-exposed photoresist, [1] 'Pre-exposure for 2-D gratings in photoresist', Optik, submitted (1992), has been discus sed. In this paper diffraction by the set of surface-relief crossed gr atings generated in the pre-exposed photoresist mixture are studied. M ethods to check the quality of these periodic structures are also exam ined. The variation of the diffraction characteristics are tested by c hanging the exposure and development parameters. We show that some gen eral trends appear to be understandable using a simple physical model.