OPTICAL-EMISSION SPECTROSCOPY OF HIGH-DENSITY METAL PLASMA FORMED DURING MAGNETRON SPUTTERING

Authors
RADZIMSKI ZJ HANKINS OE CUOMO JJ POSADOWSKI WP SHINGUBARA S
Citation
Zj. Radzimski et al., OPTICAL-EMISSION SPECTROSCOPY OF HIGH-DENSITY METAL PLASMA FORMED DURING MAGNETRON SPUTTERING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(2), 1997, pp. 202-208
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
15
Issue
2
Year of publication
1997
Pages
202 - 208
Database
ISI
SICI code
1071-1023(1997)15:2<202:OSOHMP>2.0.ZU;2-N
Abstract
The operation of a high power density magnetron source during sputteri ng of a copper target both in standard mode with argon as well as in s elf-sputtering mode without argon is discussed. Voltage-current charac teristics of the source and light emission spectra were taken for vari ous conditions of magnetron operation to understand the transition fro m standard to self-sputtering mode. A qualitative explanation of the i onization mechanism is offered based on the effect of electron tempera ture and density on the Maxwellian distribution of electron energy. (C ) 1997 American Vacuum Society.