GENERATION OF DIFFRACTION-FREE BEAMS FOR APPLICATIONS IN OPTICAL MICROLITHOGRAPHY

A new concept based on a Fabry-Perot interferometer for the generation of nondiffracting Bessel beams is described and proposed for potentia l applications in microlithography such as the fabrication of small is olated patterns. It was experimentally demonstrated that the depth of focus can be increased by a factor of about 2, and simultaneously the transverse resolution improved by a factor of 1.6, when using this tec hnique to image contact holes. The properties of simultaneous imaging of two contact holes were also investigated. It was shown experimental ly that, even in the most critical case (when the first diffraction ri ngs overlap), undesirable interference effects between the adjacent co ntact holes can be eliminated by means of a phase shifting technique. (C) 1997 American Vacuum Society.