QUANTITATIVE MEASUREMENT OF THE RESIST HEATING IN A VARIABLE SHAPED ELECTRON LITHOGRAPHY

Experiments investigating resist heating were performed in a variable shaped electron lithography system. The temperature rise and associate d change in resist sensitivity were related to the current density and size of flashes. The experiment avoids other contributing factors all owing the pure heating effect to be isolated. The response of the resi st to temperature rise was determined by direct heating of the substra te using an exposure that causes no additional heating. The resist tem perature rise under electron beam of variable size was also determined as a function of flash size and of throughput of lithography system. Applying multiple exposure with a delay between the successive shots, the time dependence on the heating effect was determined. (C) 1997 Ame rican Vacuum society.