OPTIMIZATION OF THIN-FOIL BASED PHOSPHOR SCREENS FOR CCD IMAGING IN TEM IN THE VOLTAGE RANGE OF 80-400 KV

Citation
Gy. Fan et Mh. Ellisman, OPTIMIZATION OF THIN-FOIL BASED PHOSPHOR SCREENS FOR CCD IMAGING IN TEM IN THE VOLTAGE RANGE OF 80-400 KV, Ultramicroscopy, 66(1-2), 1996, pp. 11-19
Citations number
18
Categorie Soggetti
Microscopy
Journal title
ISSN journal
03043991
Volume
66
Issue
1-2
Year of publication
1996
Pages
11 - 19
Database
ISI
SICI code
0304-3991(1996)66:1-2<11:OOTBPS>2.0.ZU;2-#
Abstract
The voltage dependence characteristics of thin-foil based phosphor scr eens in the thickness range of similar to 10-60 mu m are examined for CCD imaging in transmission electron microscopy (TEM) in the voltage r ange of 80-400 kV. The brightest screen is obtained with a P20 layer o f about 12 mu m at 80 kV, and a thicker screen lowers both the screen brightness and resolution. The thickness of the brightest screen is hi gher at higher voltages, but other considerations for a practical CCD imaging system suggest that the P20 layer should not be greater than s imilar to 18 mu m for the voltage range stated above.