The electrical properties of irradiated n-type Ge single crystals with
a carrier concentration of 10(14) cm(-3) were measured. The crystals
were grown by the Czochralski technique and doped with Sn to 10(19) cm
(-3). At the initial stage of irradiation, the radiation resistance of
Sn-doped Ge increases as compared to that of a control sample. The st
udy of relaxation during annealing reveals that the radiation-induced
acceptor defects in the irradiated samples are less thermally stable t
han in the control sample. Doping of n-type Ge with Sn to concentratio
ns above 10(19) -3 leads to a decrease in carrier mobility at temperat
ures below 200 K.