The model presented here is an extension of the carrier trapping-detra
pping model for 1/f noise, in semiconductor devices with interfaces fo
rmed by oxide or insulating layers. The validity of the conventional a
ssumptions, currently used to explain trapping-detrapping 1/f noise, i
s discussed and a revised set of assumptions is proposed. It is shown
that 1/f noise that is caused by election trapping and detrapping at o
xide interfaces, can be explained for a wide variety of activation bar
rier distributions, assuming the revised set of assumptions. (C) 1997
Elsevier Science Ltd.