Barium titanate (BaTiO3) thin films with high(111)-orientation were su
ccessfully grown on TiO2- covered Si(111) substrate using hydrothermal
method, where the TiO2 layer was previously fabricated at room temper
ature by means of ion-beam-assisted deposition. This processing method
provides a simple mild-chemical route for directly producing the anal
ogous crystalline films on different substrates. The BaTiO3 films did
not reach the TiO2/Si interface even if the hydrothermal treatment was
prolonged to 24 hours. Both Rutherford backscattering and spread-resi
stance profiling characterizations confirmed the diffusion nature of t
he formed BaTiO3/TiO2/Si system.