Mn. Webster et Ag. Dirks, AL REFLOW STUDIES FOR DEEP-SUBMICRON STRUCTURES - PROPERTIES AND MICROSTRUCTURE, Microelectronic engineering, 37-8(1-4), 1997, pp. 313-318
The aluminium filling process of vias is studied as a function of time
. New insights in the aluminium transport mechanism have been obtained
. As a result of both (Al, Ti)-compound formation and overhang during
the aluminium deposition the partly filled via is closed. The driving
force for void elimination is the minimization of the surface free ene
rgy. Material transport via dislocation mobility is suggested to play
a major role during filling of the cavity. Electrical measurements of
via strings showed a strong dependence on the liner (thickness and com
position). A high yield of low via resistances has been obtained.