M. Zaborowski et A. Barcz, MODIFICATION OF AL-BASED METALLIZATION FOR IMPROVED SURFACE-MORPHOLOGY, Microelectronic engineering, 37-8(1-4), 1997, pp. 341-346
The effect of introducing an additional interlayer into the classical
Al-based metallization on the morphology of the resultant surface is s
tudied by SEM, stylus profilometry and optical microscopy with digital
image processing. It was found that the presence of buried films of C
r, Ti, W and particularly Ti:W alloy strongly reduces the density and/
or the size of hillocks.