AUTOMATIC MASK GENERATION IN X-RAY-LITHOGRAPHY

Authors
BOLLEPALLI BS KHAN M CERRINA F
Citation
Bs. Bollepalli et al., AUTOMATIC MASK GENERATION IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2238-2242
Citations number
6
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
15
Issue
6
Year of publication
1997
Pages
2238 - 2242
Database
ISI
SICI code
1071-1023(1997)15:6<2238:AMGIX>2.0.ZU;2-C
Abstract
It is well known that diffraction plays an important role in image for mation in any photon-based lithographic system. Some of the consequenc es of diffraction are reduction in contrast of the aerial image and ph enomenon such as line-end shortening. In this article we explore some computational schemes which modify the mask pattern so as to minimize the diffractional effects. Several papers have been written on this pr oblem for the case of optical lithography. Here, we consider the case of x-ray lithography only. (C) 1997 American Vacuum Society.