Y. Watanabe et al., NOVEL ILLUMINATION SYSTEM OF SYNCHROTRON-RADIATION STEPPER WITH FULL-FIELD EXPOSURE METHOD, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2503-2508
We estimate the pattern distortion and the critical dimension (CD) var
iation due to the thermal distortion under a large exposure field for
the full field exposure method. We verify that the effect of the therm
al distortion of the mask and wafer on the pattern distortion and the
CD variation is small enough under the condition of mass production of
devices of 0.1 mu m design rule. We present a design of the novel two
mirror illumination system which can improve the throughput both by e
xposing a field as large as 50 mm square and by condensing synchrotron
radiation (SR) spread in the horizontal plane. The effects of the var
iation of the position of the SR source and the mirrors and the size o
f the SR source on the performance of the stepper are investigated. (C
) 1997 American Vacuum Society.