V. White et al., X-RAY FABRICATION OF NONORTHOGONAL STRUCTURES USING SURFACE MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2514-2516
Standard x-ray lithographic techniques allow great flexibility of geom
etry in two dimensions. Typically, the third dimension is limited to d
epth, which is purely orthogonal to the surface. We have been developi
ng a relatively simple technique using x-ray lithography and have fabr
icated a whole family of precisely controlled nonorthogonal structures
such as tapers, bridges and various ''leaning'' or blazed structures.
Traditional soft x-ray masks, create the modulation required to print
into x-ray resists by having the absorbing elements of the x-ray mask
patterned on a thin membrane. This technique involves the creation of
the gold absorbing elements of the x-ray mask directly on the surface
of the photoresist, i.e., a ''surface'' mask. These surface masks can
create nonorthogonal exposures creating blazed structures as well as
''bridges'' by tilting the sample with respect to the x-ray beam durin
g exposure. The exposures can also be done while having the tilted sam
ple rotated, creating tapered exposure profiles. In addition to the no
vel geometries, a potentially useful feature of the rotated exposures
is that the sidewalls have nanometer scale smoothness, due to the aver
aging of intensities during rotation. (C) 1997 American Vacuum Society
.