V. Chevrier et al., GAAS EPITAXY BY CHEMICAL-VAPOR TRANSPORT UNDER HIGH, EARTH AND LOW-GRAVITY CONDITIONS, Journal of crystal growth, 183(1-2), 1998, pp. 1-9
Homoepitaxy of GaAs on hemispherical substrates have been realised by
chemical vapour transport in four different gravity levels. Experiment
s have been performed on earth, under 5g and 10g acceleration conditio
ns using a centrifuge and under a microgravity environment (EURECA-I m
ission). The source was either undoped GaAs or tin-doped GaAs. Analysi
s and comparison of the grown layers show that, in the applied conditi
ons, the gravity level is not a relevant parameter and that tin is an
inhibitor for the GaAs epitaxy.