GAAS EPITAXY BY CHEMICAL-VAPOR TRANSPORT UNDER HIGH, EARTH AND LOW-GRAVITY CONDITIONS

Citation
V. Chevrier et al., GAAS EPITAXY BY CHEMICAL-VAPOR TRANSPORT UNDER HIGH, EARTH AND LOW-GRAVITY CONDITIONS, Journal of crystal growth, 183(1-2), 1998, pp. 1-9
Citations number
25
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
183
Issue
1-2
Year of publication
1998
Pages
1 - 9
Database
ISI
SICI code
0022-0248(1998)183:1-2<1:GEBCTU>2.0.ZU;2-L
Abstract
Homoepitaxy of GaAs on hemispherical substrates have been realised by chemical vapour transport in four different gravity levels. Experiment s have been performed on earth, under 5g and 10g acceleration conditio ns using a centrifuge and under a microgravity environment (EURECA-I m ission). The source was either undoped GaAs or tin-doped GaAs. Analysi s and comparison of the grown layers show that, in the applied conditi ons, the gravity level is not a relevant parameter and that tin is an inhibitor for the GaAs epitaxy.