SURFACE-STRUCTURE CONTROL OF GAAS (111)A VICINAL SUBSTRATES BY METAL-ORGANIC VAPOR-PHASE EPITAXY

Citation
Js. Lee et al., SURFACE-STRUCTURE CONTROL OF GAAS (111)A VICINAL SUBSTRATES BY METAL-ORGANIC VAPOR-PHASE EPITAXY, Journal of crystal growth, 183(1-2), 1998, pp. 43-48
Citations number
9
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
183
Issue
1-2
Year of publication
1998
Pages
43 - 48
Database
ISI
SICI code
0022-0248(1998)183:1-2<43:SCOG(V>2.0.ZU;2-W
Abstract
Periodic structures with high uniformity have been fabricated by metal -organic vapor-phase epitaxy on GaAs(111)A vicinal surfaces. Scanning electron microscope and atomic force microscope surface images show st rict dependence on substrate off-direction, growth temperature (T-g), and V/III ratio. Giant steps with long-range continuity and high unifo rmity have been formed on GaAs (111)A substrates misoriented towards t he [112] direction. In addition, the heights of the giant steps show t he saturation at high T-g: and the value is independent of substrate o ff-angle, On the other hand, homogeneous zigzag steps have emerged on the substrate off toward the [001] azimuth after the growth at high T- g, whereas relatively rough steps were formed on both substrates at lo w T-g. The results indicate the growth-mode transition from step-flow to facet formation as growth temperature gets higher.