VACUUM-ULTRAVIOLET TO VISIBLE EMISSION OF SOME PURE GASES AND THEIR MIXTURES USED FOR PLASMA PROCESSING

The vacuum ultraviolet (VUV) to near infrared emissions (112 less than or equal to lambda less than or equal to 880 nm) from molecular gases (H-2 and O-2) and molecular gas-noble gas mixtures (H-2-Ar and O-2-Ar ) have been investigated with two separate spectrophotometric instrume nts. We report the influence of plasma parameters such as gas composit ion, pressure, and microwave power upon the plasma emission. In the ca se of mixtures with noble gases, we selected a range of plasma paramet ers so as to obtain very intense VUV emissions, which can be useful fo r the photochemical treatment of polymer surfaces. Some kinetics mecha nisms involved are discussed. (C) 1998 American Vacuum Society.