LOW-TEMPERATURE (LESS-THAN-450-DEGREES-C), PLASMA-ASSISTED DEPOSITIONOF POLY-SI THIN-FILMS ON SIO2 AND GLASS THROUGH INTERFACE ENGINEERING(VOL 15, PG 1035, 1997)

Authors
WOLFE DM WANG F HABERMEHL S LUCOVSKY G
Citation
Dm. Wolfe et al., LOW-TEMPERATURE (LESS-THAN-450-DEGREES-C), PLASMA-ASSISTED DEPOSITIONOF POLY-SI THIN-FILMS ON SIO2 AND GLASS THROUGH INTERFACE ENGINEERING(VOL 15, PG 1035, 1997), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(1), 1998, pp. 207-207
Citations number
4
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
16
Issue
1
Year of publication
1998
Pages
207 - 207
Database
ISI
SICI code
0734-2101(1998)16:1<207:L(PD>2.0.ZU;2-7