ELECTRON-TRANSPORT TO A SUBSTRATE IN A RADIO-FREQUENCY CAPACITIVELY COUPLED PLASMA BY THE BOLTZMANN-EQUATION

Authors
MATSUI J SHIBATA M NAKANO N MAKABE T
Citation
J. Matsui et al., ELECTRON-TRANSPORT TO A SUBSTRATE IN A RADIO-FREQUENCY CAPACITIVELY COUPLED PLASMA BY THE BOLTZMANN-EQUATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(1), 1998, pp. 294-299
Citations number
16
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
16
Issue
1
Year of publication
1998
Pages
294 - 299
Database
ISI
SICI code
0734-2101(1998)16:1<294:ETASIA>2.0.ZU;2-7
Abstract
Anomalous etching, caused by the local charging of a patterned wafer s urface immersed in a plasma, is one of the obstacles which must be ove rcome in plasma processing. We have developed a quantitative argument for the potential control of both the fluxes and the velocity componen ts of charged particles on the wafer in a pulsed radio frequency plasm a with a short off-cycle in SF6. We have then used relaxation continuu m/Boltzmann equation model to create a phase-space model. (C) 1998 Ame rican Vacuum Society.