PLASMA RESEARCH ACTIVITIES IN THE ASSOCIATION OF SUPER-ADVANCED ELECTRONICS TECHNOLOGIES

Citation
M. Inoue et al., PLASMA RESEARCH ACTIVITIES IN THE ASSOCIATION OF SUPER-ADVANCED ELECTRONICS TECHNOLOGIES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(1), 1998, pp. 341-344
Citations number
11
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
07342101
Volume
16
Issue
1
Year of publication
1998
Pages
341 - 344
Database
ISI
SICI code
0734-2101(1998)16:1<341:PRAITA>2.0.ZU;2-1
Abstract
Association of super-advanced electronics technologies (ASET) is a Jap anese electronics research and development consortium that was founded on 29 February 1996. The target of the plasma research group in ASET is to make breakthroughs for future dry etching technology by investig ating the mechanisms of dry etching scientifically. The plasma researc h group is investigating plasma diagnostics, plasma generation and its transportation, plasma surface reaction and vapor phase reaction, pla sma modeling/simulation directed toward plasma control, and the mechan ism of silicon oxide etching in high aspect ratio, narrow contact hole s, and will develop a new chemistry, a new plasma source, and a new mo nitoring method. (C) 1998 American Vacuum Society.