M. Inoue et al., PLASMA RESEARCH ACTIVITIES IN THE ASSOCIATION OF SUPER-ADVANCED ELECTRONICS TECHNOLOGIES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(1), 1998, pp. 341-344
Citations number
11
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Association of super-advanced electronics technologies (ASET) is a Jap
anese electronics research and development consortium that was founded
on 29 February 1996. The target of the plasma research group in ASET
is to make breakthroughs for future dry etching technology by investig
ating the mechanisms of dry etching scientifically. The plasma researc
h group is investigating plasma diagnostics, plasma generation and its
transportation, plasma surface reaction and vapor phase reaction, pla
sma modeling/simulation directed toward plasma control, and the mechan
ism of silicon oxide etching in high aspect ratio, narrow contact hole
s, and will develop a new chemistry, a new plasma source, and a new mo
nitoring method. (C) 1998 American Vacuum Society.