Ar. Smith et al., INFLUENCE OF VARIOUS GROWTH-PARAMETERS ON THE INTERFACE ABRUPTNESS OFALAS GAAS SHORT-PERIOD SUPERLATTICES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1824-1829
Cross-sectional scanning tunneling microscopy has been used to investi
gate the effects of several key growth parameters on the resulting int
erfacial quality of AlAs/GaAs short period superlattices. For growth o
n top of AlGaAs layers, only superlattices grown with periodicity no s
maller than 4 unit cells of GaAs and 2 unit cells of AlAs and grown wi
th a minimum of 30 s of growth interrupt time are resolved. On the oth
er hand, when grown on top of GaAs layers, superlattices as fine as 2
unit cells of GaAs and 1 unit cell of AlAs grown with only 5 s of-grow
th interrupt time are resolved. This result suggests that the material
on which the superlattice is grown is at least as important as the gr
owth interrupt time. Tn particular, GaAs seems to provide a smoother s
tarting surface than AlGaAs and hence aids in the formation of abrupt
interfaces. We also compare our scanning tunneling microscopy data wit
h some predictions based on simple atomic models of the interfacial re
gions. (C) 1995 American Vacuum Society.