Sw. Butler, PROCESS-CONTROL IN SEMICONDUCTOR MANUFACTURING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1917-1923
Semiconductor processing requirements are creating a need for better e
quipment capabilities with respect to process control. The goal of thi
s paper is to propose the required capabilities and suggest what issue
s must be addressed in order for the equipment to have these capabilit
ies. This paper will focus on the why and how of control, such as the
components and various implementation forms of controllers, rather tha
n specific algorithms. The major concepts of process control will be p
resented, such as multivariable control systems. The basic requirement
s for control to be possible will also be introduced. The role of metr
ology as pertaining to process control methods will be presented. The
involvement of the process engineer with respect to control will be hi
ghlighted so that the proposed requirements for the flexibility and co
nfigurability of the equipment control system will be better understoo
d. Examples of process control applications in semiconductor manufactu
ring will assist in explaining the concepts introduced in this paper.
(C) 1995 American Vacuum Society.