PROCESS-CONTROL IN SEMICONDUCTOR MANUFACTURING

Authors
Citation
Sw. Butler, PROCESS-CONTROL IN SEMICONDUCTOR MANUFACTURING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1917-1923
Citations number
8
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
13
Issue
4
Year of publication
1995
Pages
1917 - 1923
Database
ISI
SICI code
1071-1023(1995)13:4<1917:PISM>2.0.ZU;2-O
Abstract
Semiconductor processing requirements are creating a need for better e quipment capabilities with respect to process control. The goal of thi s paper is to propose the required capabilities and suggest what issue s must be addressed in order for the equipment to have these capabilit ies. This paper will focus on the why and how of control, such as the components and various implementation forms of controllers, rather tha n specific algorithms. The major concepts of process control will be p resented, such as multivariable control systems. The basic requirement s for control to be possible will also be introduced. The role of metr ology as pertaining to process control methods will be presented. The involvement of the process engineer with respect to control will be hi ghlighted so that the proposed requirements for the flexibility and co nfigurability of the equipment control system will be better understoo d. Examples of process control applications in semiconductor manufactu ring will assist in explaining the concepts introduced in this paper. (C) 1995 American Vacuum Society.