GIANT ISOTOPE EFFECT IN HOT-ELECTRON DEGRADATION OF METAL-OXIDE-SILICON DEVICES

Citation
K. Hess et al., GIANT ISOTOPE EFFECT IN HOT-ELECTRON DEGRADATION OF METAL-OXIDE-SILICON DEVICES, I.E.E.E. transactions on electron devices, 45(2), 1998, pp. 406-416
Citations number
61
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
45
Issue
2
Year of publication
1998
Pages
406 - 416
Database
ISI
SICI code
0018-9383(1998)45:2<406:GIEIHD>2.0.ZU;2-W
Abstract
A giant isotope effect of hot electron degradation was found by anneal ing and passivating integrated circuits of recent complementary metal oxide silicon (CMOS) technology with deuterium instead of hydrogen. In this paper, we summarize our experience and present new results of se condary ion mass spectroscopy that correlate deuterium accumulation wi th reduced hot electron degradation. We also present a first account o f the physical theory of this effect with a view on engineering applic ation and point toward rules of current and voltage scaling as obtaine d from this theory.