ANNEALING BEHAVIOR OF INAS GAAS QUANTUM-DOT STRUCTURES/

Citation
Zm. Wang et al., ANNEALING BEHAVIOR OF INAS GAAS QUANTUM-DOT STRUCTURES/, Journal of electronic materials, 27(2), 1998, pp. 59-61
Citations number
20
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
27
Issue
2
Year of publication
1998
Pages
59 - 61
Database
ISI
SICI code
0361-5235(1998)27:2<59:ABOIGQ>2.0.ZU;2-U
Abstract
We investigate the annealing behavior of InAs layers with different th icknesses in a GaAs matrix. The diffusion enhancement by strain, which is well established in strained quantum wells, occurs in InAs/GaAs qu antum dots (QDs). A shift of the QD luminescence peak toward higher en ergies results from this enhanced diffusion. In the case of structures where a significant portion of the strain is relaxed by dislocations, the interdiffusion becomes negligible, and there is a propensity to g enerate additional dislocations. This results in a decrease of the QD luminescence intensity, and the QD peak energy is weakly affected.