T. Clarysse et W. Vandervorst, QUALIFICATION OF SPREADING RESISTANCE PROBE OPERATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 260-271
This article discusses the preliminary results obtained from an extens
ive spreading resistance probe (SRP) intercomparison conducted between
21 international laboratories with different levels of expertise both
in the U.S. and in eight European countries. In the first phase, iden
tical raw SRP model data and model calibration curves were sent around
for six different structures. The carrier and resistivity profiles ob
tained from many different versions of software packages from three di
fferent manufacturers were analyzed. The observed variations are mainl
y dominated by radius variations and differences in applied mobility m
odels. In the second phase, an extensive round robin was organized, in
volving the measurement of 22 separate samples including submicron sou
rce/drain and well implants and an ultrashallow sub-100 nm, 20 keV As
implant. All samples were initially characterized by secondary ion mas
s spectrometry and four point probe mappings. The SRP repeatability an
d reproducibility for dose, sheet resistance, and junction depth obtai
ned from a statistical analysis as defined by the International ISO 57
25 standard are discussed as well as basic operational parameters such
as bevel surface roughness, probe penetration, and bevel angle accura
cy. All results indicate that there is a need for better international
standardization of SRP operations. (C) 1998 American Vacuum Society.