A NEW DEVICE DESIGN METHODOLOGY FOR MANUFACTURABILITY

As future technology generations for integrated circuits continue to ' 'shrink,'' TCAD tools must be made more central to manufacturing issue s; thus, yield optimization and design for manufacturing (DFM) should be addressed integrally with performance and reliability when using TC AD during the initial product design, This paper defines the goals for DFM in TCAD simulations and outlines a formal procedure for achieving an optimized result (ODFM). New design of experiments (DOE), weighted least squares modeling and multiple-objective mean-variance optimizat ion methods are developed as significant parts of the new ODFM procedu re, Examples of designing a 0.18-mu m MOSFET device are given to show the impact of device design procedures on device performance distribut ions and sensitivity variance profiles.