A HARD X-RAY PROTOTYPE PRODUCTION EXPOSURE STATION AT NSLS

Exposures conducted at the NSLS R&D beamline (X-27B) for High, Aspect Ratio Precision Manufacture have proven sufficiently successful that w e are constructing a dedicated hard X-ray exposure beamline. The new b eamline (X-14B) provides an exposure field similar to 120 mm wide, thr ee times larger than that of X-27B. The scanner is based on the hydrau lic system from the X-27B program. It is optimized for planar exposure s and takes advantage of the full 525 mm stroke available. Exposures o f multiple substrates and masks will be possible, with the fixturing s upporting mounting of substrate holders from other groups (ALS, APS, C AMD, and UW). The function of this beamline is to establish a hard X-r ay exposure station where manufacturing scale protocols can be develop ed and ultimately exploited for production runs.