STUDIES OF METALLIC MULTILAYER STRUCTURES, OPTICAL-PROPERTIES, AND OXIDATION USING IN-SITU SPECTROSCOPIC ELLIPSOMETRY

In situ spectroscopic ellipsometry (SE) has been successfully used to accurately measure sputter deposition rates and optical constants of u n-oxidized metal layers and to control the growth of magnetic multilay ers. The structures include [Co/Cu](n), [Co/Au](n), [Co/Ni](n), [Co/Pd ](n) and [Co/Pd/ Au](n). Layer thickness precision is better than +/-0 .05 nm for layer thicknesses in the range of 0.2 nm to 10 nm. Closed-l oop feedback control of layer thickness is also demonstrated. Good con sistency was obtained by comparing the in situ SE results to x-ray dif fraction measurements. Dynamic oxidation studies of [Co/Au](n) and [Co /Ni](n) multilayer structures are also presented. (C) 1998 American Va cuum Society.