R. Degraeve et al., NEW INSIGHTS IN THE RELATION BETWEEN ELECTRON TRAP GENERATION AND THESTATISTICAL PROPERTIES OF OXIDE BREAKDOWN, I.E.E.E. transactions on electron devices, 45(4), 1998, pp. 904-911
In this paper it is demonstrated in a wide stress field range that bre
akdown in thin oxide lavers occurs as soon as a critical density of ne
utral electron traps in the oxide is reached, It is proven that this c
orresponds to a critical hole fluence, since a unique relationship bet
ween electron trap generation and hole fluence is found independent of
stress field and oxide thickness. in this way literature models relat
ing breakdown to hole fluence or to trap generation are linked, A new
model for intrinsic breakdown, based on a percolation concept, is prop
osed. It is shown that this model can explain the experimentally obser
ved statistical features of the breakdown distribution, such as the in
creasing spread of the Q(BD)-distribution for ultrathin oxides. An imp
ortant consequence of this large spread is the strong area dependence
of the Q(BD) for ultrathin oxides.