DEEP-LEVEL STATES IN MOVPE ALGAAS - THE INFLUENCE OF CARRIER GAS

Citation
J. Darmo et al., DEEP-LEVEL STATES IN MOVPE ALGAAS - THE INFLUENCE OF CARRIER GAS, Journal of crystal growth, 186(1-2), 1998, pp. 13-20
Citations number
28
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
186
Issue
1-2
Year of publication
1998
Pages
13 - 20
Database
ISI
SICI code
0022-0248(1998)186:1-2<13:DSIMA->2.0.ZU;2-Z
Abstract
We have studied the deep-level state content in AlGaAs grown by low-pr essure metalorganic vapour-phase epitaxy with nitrogen and hydrogen as the carrier gases at various growth temperatures. Layers grown in the Nz and H-2 ambients contain the same type of donor-like traps with ap parent activation energies 0.34, 0.56 and 0.89 eV, besides the 1.03 eV trap unique for the former layer. Moreover, the layers grown in N-2 e xhibit a lower total concentration of deep-level states as well as net residual doping concentration N-D - N-A. These results favour nitroge n as the carrier gas over hydrogen in the MOVPE process. Finally, we f ound out that increasing the temperature of epitaxial growth gradually reduces the gain observed for the carrier gas N-2. (C) 1998 Elsevier Science B.V. All rights reserved.