We have studied the deep-level state content in AlGaAs grown by low-pr
essure metalorganic vapour-phase epitaxy with nitrogen and hydrogen as
the carrier gases at various growth temperatures. Layers grown in the
Nz and H-2 ambients contain the same type of donor-like traps with ap
parent activation energies 0.34, 0.56 and 0.89 eV, besides the 1.03 eV
trap unique for the former layer. Moreover, the layers grown in N-2 e
xhibit a lower total concentration of deep-level states as well as net
residual doping concentration N-D - N-A. These results favour nitroge
n as the carrier gas over hydrogen in the MOVPE process. Finally, we f
ound out that increasing the temperature of epitaxial growth gradually
reduces the gain observed for the carrier gas N-2. (C) 1998 Elsevier
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