P. Gallborrut et al., A STUDY OF SEMICONDUCTOR SURFACES AND DEVICES BY COUPLED IR PHOTON TUNNELING AND ATOMIC-FORCE MICROSCOPY, Ultramicroscopy, 71(1-4), 1998, pp. 231-234
Processed InP and GaAs surfaces are studied by synchronous atomic-forc
e (AFM) and photon scanning tunneling microscopy (PSTM). A beam inject
ion system at 1.06 mu m in the transparency range of semiconductors is
described which makes it possible to perform total internal reflectio
n (TIR) without any specific preparation or shaping on standard wafers
. (C) 1998 Elsevier Science B.V. All rights reserved.