THE IN-AS-SB PHASE-DIAGRAM AND LPE GROWTH OF INASSB LAYERS ON INAS ATEXTREMELY LOW-TEMPERATURES

Citation
As. Popov et al., THE IN-AS-SB PHASE-DIAGRAM AND LPE GROWTH OF INASSB LAYERS ON INAS ATEXTREMELY LOW-TEMPERATURES, Journal of crystal growth, 186(3), 1998, pp. 338-343
Citations number
12
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
186
Issue
3
Year of publication
1998
Pages
338 - 343
Database
ISI
SICI code
0022-0248(1998)186:3<338:TIPALG>2.0.ZU;2-D
Abstract
A calculation of the In-As-Sb phase diagram in the low-temperature ran ge 300 400 degrees C has been made applying the rare simple solution m odel, By using the calculated data an extremely low temperature LPE wa s performed for growing InAs1-xSbx layers on InAs substrates at temper atures as low as 300 degrees C. It was shown that high-quality layers can be grown on InAs with x up to 0.26. SEM microprobe compositional a nalysis and X-ray diffraction analysis confirmed their homogeneity and high crystal quality and the promise of this material for mid-infrare d optoelectronic devices. (C) 1998 Elsevier Science B.V. All rights re served.