MODELING OF THE TEMPERATURE DISTRIBUTION IN A 3-ZONE RESISTANCE FURNACE - INFLUENCE OF FURNACE CONFIGURATION AND AMPOULE POSITION

Citation
S. Boschert et al., MODELING OF THE TEMPERATURE DISTRIBUTION IN A 3-ZONE RESISTANCE FURNACE - INFLUENCE OF FURNACE CONFIGURATION AND AMPOULE POSITION, Journal of crystal growth, 187(1), 1998, pp. 140-149
Citations number
16
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
187
Issue
1
Year of publication
1998
Pages
140 - 149
Database
ISI
SICI code
0022-0248(1998)187:1<140:MOTTDI>2.0.ZU;2-P
Abstract
A numerical modelling of the heat transport in a three-zone resistance Furnace has been performed. The results of the calculations agree ver y well with experimentally obtained temperature profiles. A strong dep endence of the calculated temperature field on the thermal conductivit y of the furnace material is observed and can be explained by nonisotr opic effects like inhomogeneities in the insulation. The simulations c all also predict the influence of modifications in the furnace set-up like an additional electromagnetic instead of an outer insulation laye r. Further. the computer model is used io reveal the influence of diff erent positions of a growth ampoule. The temperature field in the ampo ule shows a decrease of the temperature gradients at the phase boundar y at the end of the growth process and a change of the interface shape from concave to convex. (C) 1998 Elsevier Science B.V. All rights res erved.