The effect of alloying on positrons in Si1-xGex is reported. Our compu
tations are based on the independent particle model combined with the
empirical pseudopotential method. To make an allowance for the chemica
l disorder, the virtual crystal approximation is used, including a cor
rection to the alloy potential. The evolution of the positron thermali
zation energy versus mole fraction shows that the positrons diffuse be
tter over the range 0.15 less than or equal to x less than or equal to
1.0. Our calculated positron effective band masses for Si and Ge an i
n good agreement with the available experimental and theoretical ones,
and vary non-linearly from Si to Ge. The positron distribution differ
ence between different compositions indicates that the positron has an
affinity for one sort of atom in Si1-xGex. It was noted that the posi
tron is not sensitive to the disorder effect. Based on these results,
this study could stimulate further work on the alloying effect on posi
tron annihilation in semiconductor alloys. (C) 1998 Elsevier Science S
.A. All rights reserved.